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Nanoimprint lithography process chains for the fabrication of micro- and nanodevices

机译:用于制造微型和纳米器件的纳米压印光刻工艺链

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摘要

The nanoimprint lithography (NIL) process with its key elements molding and thin film pattern transfer refers to the established process chain of resist-based patterning of hard substrates. Typical processes for mass fabrication are either wafer-scale imprint or continuous roll-to-roll processes. In contrast to this, similar process chains were established for polymeric microelements fabricated by injection molding, particularly when surface topographies need to be integrated into monolithic polymer elements. NIL needs to be embedded into the frame- work of general replication technologies, with sizes ranging from nanoscopic details to macroscopic entities. This contribution presents elements of a generalized replication process chain involving NIL and demonstrates its wide application by presenting nontypical NIL products, such as an injection-molded microcantilever. Additionally, a hybrid approach combining NIL and injection molding in a single tool is presented. Its aim is to introduce a toolbox approach for nanoreplication into NIL-based processing and to facilitate the choice of suitable processes for micro- and nanodevices. By proposing a standardized process flow as described in the NaPANIL library of processes, the use of establish process sequences for new applications is facilitated.
机译:具有关键要素成型和薄膜图案转移的纳米压印光刻(NIL)工艺是指已建立的基于抗蚀剂的硬质基材图案化工艺链。大规模制造的典型过程是晶圆级压印或连续卷对卷过程。与此相反,特别是当需要将表面形貌整合到整体式聚合物元件中时,为通过注塑成型制造的聚合物微元件建立了相似的工艺链。 NIL需要嵌入到通用复制技术的框架中,其大小范围从纳米细节到宏观实体。该贡献展示了涉及NIL的通用复制过程链的要素,并通过展示非典型的NIL产品(例如注塑微悬臂梁)展示了其广泛的应用。此外,提出了在单个工具中结合NIL和注塑成型的混合方法。它的目的是将用于纳米复制的工具箱方法引入基于NIL的处理中,并促进为微型和纳米设备选择合适的处理。通过提出NaPANIL流程库中所述的标准化流程,可以促进为新应用程序使用建立流程序列。

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